Photolithography

Process

• The lithography process involving DaLI is achieved by selective exposure of photoresist using guided laser beam. No photomask lithography is required.
• Photolithography process is widely used in semiconductor and printed circuit board production industry, but it can be applied in other fields, such as MEMS, lab on a chip, microfluidics, photomask production, quantum devices, micro optics.
• In these fields the design of a new device is often iterative, that is why the maskless photolithography process proves useful, offering rapid product development in-house at no cost and waiting for new and expensive versions of photolithography masks.